Versatile fully reflective three by three beam splitter for high throughput surface texturing with high power femtosecond laser
Photonics West 2020
Authors: Ivan Gusachenko,1 Jérôme Patars,2 Gwenn Pallier,1 Anne Henrottin,2 David Bruneel,2 Pu Jian,1 Olivier Pinel,1 Jose Antonio Ramos-de-Campos,2 Guillaume Labroille1
1Cailabs (France)
2Lasea (Belgium)
The recent development of Ultra Short Pulse lasers has widely broadened the range of possibilities of laser material processing. Associated with a proper beam splitting it enables adding to the surface new properties by texturing it. We present here a fully reflective three by three beam splitter compatible with high power up to 300W with 500fs pulses lasers. The process results are presented including the repeatability of the pattern, and the achievable ablation rate. The pattern is 15µm waist gaussian beams with 300µm pitch. Compatibility with scanning system and F-theta lenses, enabling micro-processing throughput improvement, is described.